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26 March 2007 Immersion exposure tool for 45-nm HP mass production
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Canon has renewed its platform of exposure tools. The new platform, the FPA-7000, is designed to cover multiple generations. The lens performance of the FPA-7000AS5 achieves less than 6m&lgr;, while that of the AS7 is estimated to be less than 4m&lgr;. The illumination performance meets the target required for the 45nm node. The in-situ aberration monitor, called iPMI, attains the measurement repeatability of 1.45m&lgr;. Focus and overlay units have improved process robustness. A solution tool for optimization is introduced to be connected with the FPA-7000. Moreover, latest studies of immersion, such as nozzle pressure, temperature control and defect inspection result are reported, and we also discuss the possibility of high-refractive-index immersion.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroaki Kubo, Hideo Hata, Fumio Sakai, Nobuyoshi Deguchi, Takehiko Iwanaga, and Takeaki Ebihara "Immersion exposure tool for 45-nm HP mass production", Proc. SPIE 6520, Optical Microlithography XX, 65201X (26 March 2007);

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