You have requested a machine translation of selected content from our databases. This functionality is provided solely for your convenience and is in no way intended to replace human translation. Neither SPIE nor the owners and publishers of the content make, and they explicitly disclaim, any express or implied representations or warranties of any kind, including, without limitation, representations and warranties as to the functionality of the translation feature or the accuracy or completeness of the translations.
Translations are not retained in our system. Your use of this feature and the translations is subject to all use restrictions contained in the Terms and Conditions of Use of the SPIE website.
26 March 2007Quantum state control interference lithography and trim double patterning for 32-16-nm lithography
Double patterning has been proposed as a method to extend DUV lithography to 32nm and below. Here, a
new form of double, or higher, multiple exposure technique is proposed. This new form of lithography
uses a combination of Quantum State Control (QuSC) chemistry, Amplitude Modulation Optical
Lithography (AMOL), and multiple micro-stepped exposures, without development between exposures.
Further it is proposed to use this form of lithography (called QuSC-litho), to pattern a perfect grating grid,
and to trim this grid with an earlier generation lithography tool. QuSC lithography uses short optical pulses
to modulate a photochemical pathway while an intermediate is still in a defined vibrational excited state.
This is a variation of Stimulated Emission Depletion Microscopy (STED) developed for fluorescence
microscopy. With this approach immersion tools that produce 90 nm pitch and 45 nm features should be
able to pattern levels with 22 nm features with a 1:1 line-space ratio. This approach is much less sensitive
to misalignment than present double patterning approaches. Key to successful deployment of QuSC
lithography is defining a resist photochemistry consistent with the QuSC process. There are several
approaches to Photo Acid Generator (PAG) - matrix interaction that may be consistent with this approach.
The alert did not successfully save. Please try again later.
Robert D. Frankel, Bruce W. Smith, Andrew Estroff, "Quantum state control interference lithography and trim double patterning for 32-16-nm lithography," Proc. SPIE 6520, Optical Microlithography XX, 65202L (26 March 2007); https://doi.org/10.1117/12.717731