Paper
26 March 2007 A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography
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Abstract
We have developed a solid-state 193-nm laser source operating at 5-kHz that generates a near-diffraction-limited TEM00 beam with 35 mW average power. The frequency spectrum is Gaussian, with a linewidth ~7-pm (FWHM), corresponding to a coherence length of ~2-mm. The output beam also has a very high degree of spatial coherence. This source was used in an interferometric liquid-immersion lithography test stand to produce 40- and 35-nm half-pitch grating structures over a ~0.6-mm field of view with a commercially available chemically-amplified photoresist.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew J. Merriam, Donald S. Bethune, John A. Hoffnagle, William D. Hinsberg, C. Michael Jefferson, James J. Jacob, and Timothy Litvin "A solid-state 193-nm laser with high spatial coherence for sub-40-nm interferometric immersion lithography", Proc. SPIE 6520, Optical Microlithography XX, 65202Z (26 March 2007); https://doi.org/10.1117/12.712210
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CITATIONS
Cited by 10 scholarly publications and 2 patents.
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KEYWORDS
Semiconducting wafers

Interferometry

Visibility

Immersion lithography

Laser sources

Solid state lasers

Interferometers

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