Paper
27 March 2007 Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography
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Abstract
Reliable high power 193nm ArF light source is desired for the successive growth of ArF-immersion technology for 45nm node generation. In 2006, Gigaphoton released GT60A, high power injection locked 6kHz/60W/0.5pm (E95) laser system, to meet the demands of semiconductor markets. In this paper, we report key technologies for reliable mass production GT laser systems and GT60A high durability performance test results up to 20 billion pulses.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hidenori Watanabe, Shigeo Komae, Satoshi Tanaka, Ryoichi Nohdomi, Taku Yamazaki, Hiroaki Nakarai, Junichi Fujimoto, Takashi Matsunaga, Takashi Saito, Kouji Kakizaki, and Hakaru Mizoguchi "Reliable high-power injection locked 6kHz 60W laser for ArF immersion lithography", Proc. SPIE 6520, Optical Microlithography XX, 652031 (27 March 2007); https://doi.org/10.1117/12.711258
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CITATIONS
Cited by 3 scholarly publications and 1 patent.
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KEYWORDS
Molybdenum

High power lasers

Laser systems engineering

Laser applications

Light sources

Systems modeling

Electrodes

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