Toward standard process models for OPC

Yuri Granik; Dmitry Medvedev; Nick Cobb

doi:10.1117/12.712229

27 March 2007 Toward standard process models for OPC

Yuri Granik, Dmitry Medvedev, Nick Cobb

Proceedings Volume 6520, Optical Microlithography XX; 652043 (2007) https://doi.org/10.1117/12.712229
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

We present description of the Compact Model 1 (CM1) resist model designed for use in OPC and OPC verification. We discuss model formulation and compare model predictions to the resist measurements. We propose to use CM1 model as a standard pattern transfer model during chip-scale process simulations.

Citation Download Citation

Yuri Granik, Dmitry Medvedev, and Nick Cobb "Toward standard process models for OPC", Proc. SPIE 6520, Optical Microlithography XX, 652043 (27 March 2007); https://doi.org/10.1117/12.712229

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