27 March 2007 Toward standard process models for OPC
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Abstract
We present description of the Compact Model 1 (CM1) resist model designed for use in OPC and OPC verification. We discuss model formulation and compare model predictions to the resist measurements. We propose to use CM1 model as a standard pattern transfer model during chip-scale process simulations.
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Yuri Granik, Dmitry Medvedev, Nick Cobb, "Toward standard process models for OPC", Proc. SPIE 6520, Optical Microlithography XX, 652043 (27 March 2007); doi: 10.1117/12.712229; https://doi.org/10.1117/12.712229
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