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27 March 2007 Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window
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Abstract
As semiconductor technology moves toward and beyond the 65 nm lithography node, the importance of Optical Proximity Correction (OPC) models grows due to the lithographer's need to ensure high fidelity in the mask- to-silicon transfer. This, in turn, causes OPC model complexity to increase as NA increases and minimum feature size on the mask decreases. Subtle effects, that were considered insignificant, can no longer be ignored. Depending on the imaging system, three dimensional mask effects need to be included in OPC modeling. These effects can be used to improve model accuracy and to better predict the final process window. In this paper, the effects of 3D mask topology on process window are studied using several 45 nm node mask structure types. Simulations are conducted with and without a polarized illumination source. The benefits of using an advanced model algorithm, that comprehends 3D mask effects, will be discussed. To quantify the potential impact of this methodology, relative to current best known practices, all results are compared to those obtained from a model using a conventional thin film mask.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Saied, F. Foussadier, J. Belledent, Y. Trouiller, I. Schanen, C. Gardin, J. C. Urbani, P. K. Montgomery, F. Sundermann, F. Robert, C. Couderc, F. Vautrin, G. Kerrien, J. Planchot, E. Yesilada, C. Martinelli, B. Wilkinson, A. Borjon, L. Le-Cam, J. L. Di-Maria, Y. Rody, N. Morgana, and Vincent Farys "Three-dimensional mask effects and source polarization impact on OPC model accuracy and process window", Proc. SPIE 6520, Optical Microlithography XX, 65204Q (27 March 2007); https://doi.org/10.1117/12.715120
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