21 March 2007 A rigorous method to determine printability of a target layout
Author Affiliations +
We present a necessary condition for an arbitrary 2-dimensional pattern to be printable by optical projection lithography. We call a pattern printable if it satisfies a given set of edge-placement tolerances for a given lithography model and process-window. The test can be made specific to a lithography model, or it can be made generic for a wavelength and numerical aperture. In the generic form, if a pattern is found to be not printable, the conclusion is valid for all RET technologies except for non-linear techniques such as litho-etch-litho-etch double-patterning and multi-photon lithography. The test determines printability of a target layout without applying RET/OPC.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bayram Yenikaya, Bayram Yenikaya, Apo Sezginer, Apo Sezginer, } "A rigorous method to determine printability of a target layout", Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652112 (21 March 2007); doi: 10.1117/12.711530; https://doi.org/10.1117/12.711530


Verifying RET mask layouts
Proceedings of SPIE (July 12 2002)
Programmable RET mask layout verification
Proceedings of SPIE (December 27 2002)
Impact of resist blur on MEF, OPC, and CD control
Proceedings of SPIE (May 28 2004)
Dense only phase-shift template lithography
Proceedings of SPIE (July 10 2003)

Back to Top