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21 March 2007 A rigorous method to determine printability of a target layout
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Abstract
We present a necessary condition for an arbitrary 2-dimensional pattern to be printable by optical projection lithography. We call a pattern printable if it satisfies a given set of edge-placement tolerances for a given lithography model and process-window. The test can be made specific to a lithography model, or it can be made generic for a wavelength and numerical aperture. In the generic form, if a pattern is found to be not printable, the conclusion is valid for all RET technologies except for non-linear techniques such as litho-etch-litho-etch double-patterning and multi-photon lithography. The test determines printability of a target layout without applying RET/OPC.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Bayram Yenikaya and Apo Sezginer "A rigorous method to determine printability of a target layout", Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 652112 (21 March 2007); https://doi.org/10.1117/12.711530
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