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3 May 2007 Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer
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Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330C (2007)
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Managing the total CD error in advanced mask manufacturing requires that error contributions from writing, process and metrology are minimized. This paper describes how both the writing and process contributions have been addressed in the Sigma7500 DUV laser pattern generator, which prints masks by imaging a programmable spatial light modulator (SLM). System enhancements have reduced the writing contribution to global CD uniformity to 5 nm (3s). Process-related CD error sources, such as the signatures from mask developing and etching can be significant contributors to the total CD error in mask manufacturing. These errors are classified as being either pattern-independent or pattern-dependent, and the effects of both can be reduced using the ProcessEqualizer feature of the Sigma7500. This software tool performs CD sizing during writing based on pattern density maps derived during mask data preparation, along with tunable parameters that are determined experimentally. The CD sizing function has no effect on system throughput and does not require flattening and re-fracturing of the pattern data.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert Eklund, Anders Österberg, Jonas Hellgren, Hans Fosshaug, Tord Karlin, and Tom Newman "Improved CD uniformity for advanced masks using the Sigma7500 pattern generator and ProcessEqualizer", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330C (3 May 2007);

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