Translator Disclaimer
3 May 2007 Metrology capabilities and performance of the new DUV scatterometer of the PTB
Author Affiliations +
Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330H (2007)
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
At PTB a new type of DUV scatterometer has been developed and set up. The concept of the system is very variable, so that many different types of measurements like e. g. goniometric scatterometry, ellipsometric scatterometry, polarisation dependent reflectometry and ellipsometry can be performed. The main applications are CD, pitch and edge profile characterisation of nano-structured surfaces mainly, but not only, on photomasks. Different operation wavelength down to 193nm can be used. The system is not only a versatile tool for a variety of different at-wavelength metrology connected with state-of-the-art photolithography. It allows also to adapt and to vary the measurand and measurement geometry to optimise the sensitivity and the unambiguity for the measurement problem. In this paper the system is presented and described in detail for the first time. Additionally first measurements of grating test structures on a 193nm CoG photomasks are presented. The measurements have to be evaluated by solving the inverse diffraction problem. We finally give a short overview of the evaluation method developed and used by us.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Matthias Wurm, Bernd Bodermann, and Frank Pilarski "Metrology capabilities and performance of the new DUV scatterometer of the PTB", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330H (3 May 2007);

Back to Top