3 May 2007 Investigation of capillary bridges growth in NIL process
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Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65330O (2007); doi: 10.1117/12.736914
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Abstract
It is well admitted that NanoImprint is a powerfull next generation lithography. Nevertheless many defects may appear during a NanoImprint process. Some of them are clearly related to the stamp or polymer surface properties, or the stamp pattern symmetry breakdown. This paper will address the defectivity issue in imprint process and specially in non printed areas where resist features may appear. They are related to capillary forces between the stamp surface and the polymer. The understanding of their growth with respect to mold-polymer distance and printing process is presented. A specific stamp, with cavity depths ranging from 12-224 nm, has been designed to control the capillary bridge growth. The resulting capillary bridges were characterized as a function of the cavity depth, printing temperature, resist thickness and printing time. Results show that capillary bridge number is strongly influenced by cavity depth and in a less extent by temperature and printing time.
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Stefan Landis, Tanguy Leveder, Nicolas Chaix, Cecile Gourgon, "Investigation of capillary bridges growth in NIL process", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65330O (3 May 2007); doi: 10.1117/12.736914; https://doi.org/10.1117/12.736914
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KEYWORDS
Bridges

Capillaries

Printing

Polymers

Nanoimprint lithography

Photoresist processing

Etching

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