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3 May 2007 A complete set of the special process equipment for the defect-free production of reticles
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Proceedings Volume 6533, 23rd European Mask and Lithography Conference; 65331B (2007) https://doi.org/10.1117/12.736525
Event: European Mask and Lithography Conference2007, 2007, Grenoble, France
Abstract
The paper presents an integrated solution of a problem to develop a set of the equipment for the defect-free production of reticles and photomasks. The integrated approach to the equipment design allows to obtain certain advantages disclosed below. Accordingly, the paper highlights the following main issues: *Practical realization of these advantages in the special process equipment developed by the KBTEM-OMO enterprise of the PLANAR. *Advantages in the development of a complete set of the special process equipment; Without taking into account technical and chemical processes, this complete set includes three component parts: *Multi-beam laser pattern generator; *Die-to-Database reticle inspection system; *Laser reticle repair system.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Syarhei Avakaw, Valerian Iouditski, Leanid Pushkin, and Alena Tsitko "A complete set of the special process equipment for the defect-free production of reticles", Proc. SPIE 6533, 23rd European Mask and Lithography Conference, 65331B (3 May 2007); https://doi.org/10.1117/12.736525
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