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18 May 2007 State-of-the-art thin film x-ray optics for synchrotrons and FEL sources
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Abstract
Selected aspects of simulation, preparation and characterization of total reflection and multilayer X-ray optics will be discussed. The best multilayer is found by calculating the optical properties of the coating. Sophisticated improvements in deposition technology allow the precise realization of the specified parameters when manufacturing the X-ray optics. The quality of the shape of the substrate for the optics is measured with the aid of profilometry. X-ray reflectometry measures both film thickness as well as their lateral gradient. Last but not least we will be showing results of the development of carbon coatings as total reflection mirrors for FEL (free electron laser) sources. Over the past years we have developed optimized optics for the XUV range up to 200 eV. First FEL irradiation tests have shown that carbon coatings offer high reflectivity > 95%, high radiation stability, good uniformity in thickness and roughness. An optimized coating of two stripes for different beam energies was produced especially for a tomography beamline, where a Ru/C multilayer was chosen for energies between 10 and 22 keV and a W/Si multilayer for energies between 22 and 45 keV.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank Hertlein, Jörg Wiesmann, Carsten Michaelsen, Michael Störmer, and Andreas Seifert "State-of-the-art thin film x-ray optics for synchrotrons and FEL sources", Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 658608 (18 May 2007); https://doi.org/10.1117/12.722452
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