Multilayers for next-generation x-ray sources

S. Bajt; H. N. Chapman; E. Spiller; S. Hau-Riege; J. Alameda; A. J. Nelson; C. C. Walton; B. Kjornrattanawanich; A. Aquila; F. Dollar; E. Gullikson; C. Tarrio; S. Grantham

doi:10.1117/12.724786

18 May 2007 Multilayers for next-generation x-ray sources

S. Bajt, H. N. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. J. Nelson, C. C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, S. Grantham

Author Affiliations +

Proceedings Volume 6586, Damage to VUV, EUV, and X-ray Optics; 65860J (2007) https://doi.org/10.1117/12.724786
Event: International Congress on Optics and Optoelectronics, 2007, Prague, Czech Republic

Abstract

Multilayers are artificially layered structures that can be used to create optics and optical elements for a broad range of x-ray wavelengths, or can be optimized for other applications. The development of next generation x-ray sources (high brightness synchrotrons and x-ray free electron lasers) requires advances in x-ray optics. Newly developed multilayer-based mirrors and optical elements enabled efficient band-pass filtering, focusing and time resolved measurements in recent FLASH (Free Electron LASer in Hamburg) experiments. These experiments are providing invaluable feedback on the response of the multilayer structures to high intensity, short pulsed x-ray sources. This information is crucial to design optics for future x-ray free electron lasers and to benchmark computer codes that simulate damage processes.

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S. Bajt, H. N. Chapman, E. Spiller, S. Hau-Riege, J. Alameda, A. J. Nelson, C. C. Walton, B. Kjornrattanawanich, A. Aquila, F. Dollar, E. Gullikson, C. Tarrio, and S. Grantham "Multilayers for next-generation x-ray sources", Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 65860J (18 May 2007); https://doi.org/10.1117/12.724786

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