Resistivity for deep-UV laser irradiation in fluorine doped silica glass fiber

Masanori Oto

doi:10.1117/12.723972

18 May 2007 Resistivity for deep-UV laser irradiation in fluorine doped silica glass fiber

Masanori Oto

Proceedings Volume 6586, Damage to VUV, EUV, and X-ray Optics; 65860N (2007) https://doi.org/10.1117/12.723972
Event: International Congress on Optics and Optoelectronics, 2007, Prague, Czech Republic

Abstract

Optical fibers for propagating deep ultraviolet light were developed using fluorine doped silica glasses called modified fused silica. Optimizing the fiber drawing conditions improved the transmission of the fiber in the deep UV region. The transmittance of the fiber at 193 nm reached more than 65% per 1 m long without reflection loss. Significant absorption bands from defects were not observed throughout the wavelengths of the deep UV-visible-infrared region. Hydrogen-impregnation into the fibers suppressed the degradation of the transmission induced by irradiating with an ArF excimer laser and 4th harmonic generation of Nd:YAG laser. Transmission in the DUV region and resistance to laser irradiation were drastically improved compared to high OH silica fibers.

Citation Download Citation

Masanori Oto "Resistivity for deep-UV laser irradiation in fluorine doped silica glass fiber", Proc. SPIE 6586, Damage to VUV, EUV, and X-ray Optics, 65860N (18 May 2007); https://doi.org/10.1117/12.723972

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