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5 March 2007 Atomic motion in the thermal field of dissipative matter near the surface of material
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Proceedings Volume 6595, Fundamental Problems of Optoelectronics and Microelectronics III; 659512 (2007) https://doi.org/10.1117/12.726450
Event: Fundamental Problems of Optoelectronics and Microelectronics III, 2006, Harbin, China
Abstract
The theory of atomic motion in resonant radiation in the vicinity of the material surface has attracted considerable attention in recent years because of the possibility of applying the theory to different problems of micro- and nanophysics. In the present paper the influence of the thermal field on the atomic motion near the surface of dielectric matter is analyzed. Thermal field due to fluctuations of charge in matter, exist not only inside every dissipative matter but externally including standing waves and plane running waves. We derive expressions for the corresponding forces F1 and F2 and discuss their. If the distance z between the atom and surface is large ( kz >> 1 ) the force F2 which is independent from z is substantial. This force is directed opposite to atomic velocity. The spectral density of the F1 is proportional to the gradient of spectral density of thermal energy which is proportional (at z → 0 ) to z-3 . Therefore if the distance z is small ( kz << 1 ) the force F1 can be quite substantial. If the atomic frequency lie in the visible or infrared areas of spectrum the forces F1 and F2 tends to reflect the atom from the dielectric surface.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
B. B. Averbukh and I. B. Averbukh "Atomic motion in the thermal field of dissipative matter near the surface of material", Proc. SPIE 6595, Fundamental Problems of Optoelectronics and Microelectronics III, 659512 (5 March 2007); https://doi.org/10.1117/12.726450
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