Oxide thin films deposited by means of laser ablation: structure and properties

Jan Kusinski; Agnieszka Kopia; Magdalena Chmielowska; Slawomir Kac; Jan Marczak; Jozef Firak

doi:10.1117/12.726531

20 February 2007 Oxide thin films deposited by means of laser ablation: structure and properties

Jan Kusinski, Agnieszka Kopia, Magdalena Chmielowska, Slawomir Kac, Jan Marczak, Jozef Firak

Proceedings Volume 6598, Laser Technology VIII: Applications of Lasers; 659808 (2007) https://doi.org/10.1117/12.726531
Event: Laser Technology VIII, 2006, Szczecin, Poland

Abstract

Thin films of CeO₂ doped with Cu or Nd and Bi₂O₃ doped with Y were elaborated by Pulsed Laser Deposition technique from sintered Cu-CeO₂, Nd-CeO₂ and Bi₂O₃ or Y- Bi₂O₃ targets. Two types of laser ablation equipment have been applied: one worked with a KrF excimer and second with an Q-switched Nd:YAG. The films were deposited on (100) and (110) oriented Si substrates. Scanning and transmission electron microscopy, as well as, x-ray diffraction analyses showed correlation between a copper and neodymium atom fractions and crystalline structure of the (Cu, Ce)O₂ and (Nd, Ce)O₂ thin films. As demonstrated by x-ray diffraction analysis, with increased quantity of Cu, and Nd the both types of doped CeO₂ thin films manufactured by laser ablation show a change of the crystal growth preferential orientation (c-axis- orientation) from strong <111> to a strong <200> ones. In case of pure bismuth oxide deposition, both TEM and X-ray examinations revealed that at applied experimental conditions only &agr; - Bi₂O₃ (not &dgr; - Bi₂O₃) crystals were formed during ablation process. Microstructural TEM examinations permitted to show high grain refinement in Y- Bi₂O₃ thin films. Preliminary measurements show also high level of electrical conductivity in case of this oxide. Due to SiO₂ amorphous layer present at the surface of Si substrate, its crystallographic orientation doesn't influence the thin film structure of all analyzed oxides.

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Jan Kusinski, Agnieszka Kopia, Magdalena Chmielowska, Slawomir Kac, Jan Marczak, and Jozef Firak "Oxide thin films deposited by means of laser ablation: structure and properties", Proc. SPIE 6598, Laser Technology VIII: Applications of Lasers, 659808 (20 February 2007); https://doi.org/10.1117/12.726531

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KEYWORDS

Thin films

Bismuth

Copper

Oxides

Neodymium

Crystals

Transmission electron microscopy

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