Paper
22 June 2007 Numerical simulations of low-frequency noise in RuO2-glass films
Author Affiliations +
Proceedings Volume 6600, Noise and Fluctuations in Circuits, Devices, and Materials; 66000Q (2007) https://doi.org/10.1117/12.726235
Event: SPIE Fourth International Symposium on Fluctuations and Noise, 2007, Florence, Italy
Abstract
The paper deals with low-frequency noise in RuO2-glass thick resistive films at low temperatures. Careful measurements performed with ac technique reveal that below liquid helium temperature and in the low frequency limit excess noise of the films is a pure resistance noise for low bias voltage, but at larger voltages depends sublinearly on voltage square. The model is proposed which shows that the observed noise suppression is due to inhomogeneous heating of devices under test. In this model conduction is via hopping and the noise is due to fluctuation of activation energies of the inter-site conductances. Numerical simulations show that there is an interesting scaling of noise that can be used to identify the local (microscopic) mechanism of heat transfer from electron to phonon systems.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Adam W. Stadler and Andrzej Kolek "Numerical simulations of low-frequency noise in RuO2-glass films", Proc. SPIE 6600, Noise and Fluctuations in Circuits, Devices, and Materials, 66000Q (22 June 2007); https://doi.org/10.1117/12.726235
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Cited by 3 scholarly publications.
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KEYWORDS
Numerical simulations

Helium

Instrument modeling

Liquids

Phonons

Resistance

Systems modeling

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