25 April 2007 Nanosecond UV laser-induced nanoablation of diamond surface
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Proceedings Volume 6606, Advanced Laser Technologies 2006; 66060F (2007) https://doi.org/10.1117/12.729579
Event: Advanced Laser Technologies 2006, 2006, Brasov, Romania
Abstract
Experimental results are reported on the surface nanoablation of diamond single crystal induced by nanosecond pulses (&tgr;=15 ns) of KrF excimer laser (&lgr;=248 nm) at fluence below a graphitization threshold of diamond. The relatively low etching rate (less 1nm/1000 pulses) in this regime has been studied depending on both laser fluence and external experimental conditions (ambient gas and temperature). The photochemical mechanism is proposed to explain the nanoablation of diamond surface.
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V. V. Kononenko, V. V. Kononenko, M. S. Komlenok, M. S. Komlenok, V. I. Konov, V. I. Konov, S. M. Pimenov, S. M. Pimenov, } "Nanosecond UV laser-induced nanoablation of diamond surface", Proc. SPIE 6606, Advanced Laser Technologies 2006, 66060F (25 April 2007); doi: 10.1117/12.729579; https://doi.org/10.1117/12.729579
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