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Substrate effects on the characteristics of haze defect formation on the photomask surface under exposure condition
Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control
Optimization of electrostatic chuck for mask-blank flatness control in extreme ultraviolet lithography
Layout and EB data reduction: comparison of OASIS based approach with format-specific reversible compressions
Novel solution for in-die phase control under scanner equivalent optical settings for 45-nm node and below
Polarized transmittance-reflectance scatterometry measurements of 2D trench dimensions on phase-shift masks