Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Yosuke Kojima; Masanori Shirasaki; Kazuaki Chiba; Tsuyoshi Tanaka; Yukio Inazuki; Hiroki Yoshikawa; Satoshi Okazaki; Kazuya Iwase; Kiichi Ishikawa; Ken Ozawa

doi:10.1117/12.728925

11 May 2007 Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control

Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, Ken Ozawa

Author Affiliations +

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070C (2007) https://doi.org/10.1117/12.728925
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

For 45 nm node and beyond, the alternating phase-shift mask (alt. PSM), one of the most expected resolution enhancement technologies (RET) because of its high image contrast and small mask error enhancement factor (MEEF), and the binary mask (BIM) attract attention. Reducing CD and registration errors and defect are their critical issues. As the solution, the new blank for alt. PSM and BIM is developed. The top film of new blank is thin Cr, and the antireflection film and shielding film composed of MoSi are deposited under the Cr film. The mask CD performance is evaluated for through pitch, CD linearity, CD uniformity, global loading, resolution and pattern fidelity, and the blank performance is evaluated for optical density, reflectivity, sheet resistance, flatness and defect level. It is found that the performance of new blank is equal to or better than that of conventional blank in all items. The mask CD performance shows significant improvement. The lithography performance of new blank is confirmed by wafer printing and AIMS measurement. The full dry type alt. PSM has been used as test plate, and the test results show that new blank can almost meet the specifications of pi-0 CD difference, CD uniformity and process margin for 45 nm node. Additionally, the new blank shows the better pattern fidelity than that of conventional blank on wafer. AIMS results are almost same as wafer results except for the narrowest pattern. Considering the result above, this new blank can reduce the mask error factors of alt. PSM and BIM for 45 nm node and beyond.

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Yosuke Kojima, Masanori Shirasaki, Kazuaki Chiba, Tsuyoshi Tanaka, Yukio Inazuki, Hiroki Yoshikawa, Satoshi Okazaki, Kazuya Iwase, Kiichi Ishikawa, and Ken Ozawa "Alternating phase-shift mask and binary mask for 45-nm node and beyond: the impact on the mask error control", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070C (11 May 2007); https://doi.org/10.1117/12.728925

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