12 May 2007 Step and flash imprint lithography template fabrication for emerging market applications
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070T (2007) https://doi.org/10.1117/12.728943
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
The Step and Flash Imprint Lithography (S-FILTM) process uses field-to-field drop dispensing of UV curable liquids for step and repeat patterning for applications where high-resolution mix-and-match overlay is desired. Several applications, including patterned media, photonic crystals and wire grid polarizers, are better served by a patterning process that prints the full wafer since alignment requirements are not so stringent. In this paper, a methodology for creating high resolution thin templates for full wafer (or disk) imprinting is described. The methods have been applied toward the imprinting of both photonic crystal and patterned media devices using a large area printing tool developed around the S-FIL process.
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Douglas J. Resnick, Douglas J. Resnick, Gerard Schmid, Gerard Schmid, Mike Miller, Mike Miller, Gary Doyle, Gary Doyle, Chris Jones, Chris Jones, Dwayne LaBrake, Dwayne LaBrake, } "Step and flash imprint lithography template fabrication for emerging market applications", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070T (12 May 2007); doi: 10.1117/12.728943; https://doi.org/10.1117/12.728943
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