14 May 2007 3D template fabrication process for the dual damascene NIL approach
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070U (2007); doi: 10.1117/12.728944
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
NIL technique enables an easy replication of three dimensional patterns. Combined with a UV printable low-k material the NIL lithography can dramatically simplify the dual damascene process. Goal of this work was to develop a template process scheme which enables the generation of high resolution pillars on top of corresponding lines for direct printing of later vias and metal lines. The process flow is based on conventional 6025 photomask blanks. Exposure was done on a variable shaped e-beam writer Vistec SB350 using a sample of an advanced negative tone CAR and Fujifilm pCAR FEP171 for the first and the second layer, respectively. Chrome and quartz etching was accomplished in an Oerlikon mask etcher Gen III and Gen IV. Assessment of the developed template process was done in terms of overlay accuracy, feature profile and resolution capability depending on aspect ratio and line duty cycle. Finally the printability of 3D templates fabricated according the developed process scheme was proved.
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Joerg Butschke, Mathias Irmscher, Douglas Resnick, Holger Sailer, Ecron Thompson, "3D template fabrication process for the dual damascene NIL approach", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070U (14 May 2007); doi: 10.1117/12.728944; https://doi.org/10.1117/12.728944
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KEYWORDS
Etching

Photomasks

Quartz

Nanoimprint lithography

Photoresist processing

Electron beam lithography

Lithography

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