11 May 2007 Data exploder for variable shaped beam exposure
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66070W (2007) https://doi.org/10.1117/12.728946
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
As the industry moves to 45nm and beyond, rapidly increasing file sizes are an obstacle to achieving fast turnaround time for mask manufacturing. Conventional Mask Data Preparation (MDP) requires the production of large files, in a format specific to each make and model of E-beam tool. An alternative approach extracts the data from a data file already present in the MDP flow, and provides it directly to the E-beam tool. This extraction is called a "Data Exploder", because the output data volume can be larger than the input data. Exploding the data in real-time saves the time required to write and then read large disk files. The Data Exploder is compatible with multithread and multiprocess parallel reading. The practical application and limitations of the Data Exploder are described, including throughput performance, requirements for disk storage, network interconnect, and CPU configurations.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John Nogatch, Hartmut Kirsch, Jun Shi, "Data exploder for variable shaped beam exposure", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66070W (11 May 2007); doi: 10.1117/12.728946; https://doi.org/10.1117/12.728946
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