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14 May 2007CD metrology by an immersion microscope with high NA condenser lens for 45-nm generation masks
An immersion microscope with high NA condenser lens is evaluated. The effects of high NA condenser lens are studied
with simulation and experiment. The one effect is CD linearity improvement. We have already reported that our
calibration method improves CD linearity of an immersion microscope. The simulation result indicates the high NA
condenser lens improves the accuracy of the calibration method. The other effect is CD repeatability. The experimental
result demonstrates the high NA condenser lens reduces the peak of intensity profile and improves CD repeatability. As
the result, an immersion microscope with high NA condenser lens is available for CD measurement of 45 nm generation
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Takeshi Yamane, Rikiya Taniguchi, Takashi Hirano, "CD metrology by an immersion microscope with high NA condenser lens for 45-nm generation masks," Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660711 (14 May 2007); https://doi.org/10.1117/12.728950