Water-based ArF Immersion Lithography has overcome obstacles and enabled the 45nm node of mass
products. Canon has developed immersion exposure system the FPA7000 AS7 for 45nm node. The new
platform, the FPA-7000, is designed to cover multiple generations. The lens performance about wavefront
aberration of the FPA-7000AS7 is predicted to be less than 4m&lgr;. The illumination performance meets the
target required for the 45nm node. A solution tool for optimization is introduced to be connected with the
FPA-7000. Moreover, latest studies of immersion, such as nozzle pressure, temperature control and defect
inspection result are reported, and also discusses the possibility of high-refractive-index immersion.