29 May 2007 Stray-light implementation in optical proximity correction (OPC)
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66071M (2007) https://doi.org/10.1117/12.728969
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect. Appropriate approximation is introduced for stray-light implemented OPC in such a large scale. This paper also addresses other practical problems in the stray-light OPC and presents how to solve the problems.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young-Chang Kim, Donghyun Kim, Insung Kim, Sangwook Kim, Sungsoo Suh, Yong-Jin Chun, Sukjoo Lee, Junghyeon Lee, Chang-Jin Kang, Jootae Moon, Kunal Taravade, Sooryong Lee, "Stray-light implementation in optical proximity correction (OPC)", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071M (29 May 2007); doi: 10.1117/12.728969; https://doi.org/10.1117/12.728969
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