29 May 2007 Stray-light implementation in optical proximity correction (OPC)
Author Affiliations +
Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66071M (2007) https://doi.org/10.1117/12.728969
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
It is suggested that stray-light (SL, also called flare, scattered light) impact can be compensated by modifying standard OPC method. Compared to traditional optical proximity effect caused by diffraction limit, stray light leads to extremely long range (~ 100 micrometer ~ 10 millimeter) proximity effect. Appropriate approximation is introduced for stray-light implemented OPC in such a large scale. This paper also addresses other practical problems in the stray-light OPC and presents how to solve the problems.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Young-Chang Kim, Young-Chang Kim, Donghyun Kim, Donghyun Kim, Insung Kim, Insung Kim, Sangwook Kim, Sangwook Kim, Sungsoo Suh, Sungsoo Suh, Yong-Jin Chun, Yong-Jin Chun, Sukjoo Lee, Sukjoo Lee, Junghyeon Lee, Junghyeon Lee, Chang-Jin Kang, Chang-Jin Kang, Jootae Moon, Jootae Moon, Kunal Taravade, Kunal Taravade, Sooryong Lee, Sooryong Lee, } "Stray-light implementation in optical proximity correction (OPC)", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66071M (29 May 2007); doi: 10.1117/12.728969; https://doi.org/10.1117/12.728969
PROCEEDINGS
10 PAGES


SHARE
Back to Top