14 May 2007 Reduction of resist heating effect by writing order optimization: part II
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 660721 (2007) https://doi.org/10.1117/12.728984
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
This paper presents an experimental study of resist heating effect in mask making with a variable shaped electron beam mask writer. Experiments were performed at current densities of 40 and 80 A/cm2 on mask blanks with a chemically amplified resist. At these levels of current density, the critical dimension change due to resist heating effect was obvious. The critical dimension change was reduced with a checkerwise writing method, in which sub-fields were arranged in main fields in an alternate fashion so that the average incoming heat per unit area due to beam exposure could be reduced. The reduction factor was 2 or more.
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Kazuya Goto, Kazuya Goto, Kazutaka Watakabe, Kazutaka Watakabe, Tadashi Komagata, Tadashi Komagata, Yasutoshi Nakagawa, Yasutoshi Nakagawa, } "Reduction of resist heating effect by writing order optimization: part II", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660721 (14 May 2007); doi: 10.1117/12.728984; https://doi.org/10.1117/12.728984
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