15 May 2007 Making of P10-JOBDECK with OASIS and GDS-II fit for practical use
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66072O (2007) https://doi.org/10.1117/12.729007
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
Recently, mask design has been becoming more complex with the increase of data volume. Therefore, it requires more functionality and portability in the mask specification and layout definition for the efficient data handling together with industry standard. SEMI-P10 order format has universal layout definition for the all sorts of mask specifications. We expect OASISTM (Open Artwork System Interchange Standard; SEMI standard P39) instead of conventional GDS-II to come into wide use as a more compressive stream format for 45nm node and beyond. The OASIS format is suitable for the enormous pattern file size and sub-nanometer design grid. Although SEMI-P10 is convenient to achieve all of our requirements, its complete definition is very complicated and is difficult to set up full parameters in the primary stage of mask design for production chips. In this work, we focused on minimum syntax of the chip location information from portion of SEMI-P10. And we define P10-JOBDECK as a subset of whole SEMI-P10 regulations. So, by use of P10-JOBDECK and OASIS data format, we have built up the new data handling infrastructure such as data file transfer and pattern layout viewing for the high-end mask manufacturing. In this system, the coordinates of P10-JOBDECK are described in 4X image with mirror inversion and tone reversal parameters. We use 1X coordinates in P10-JOBDECK for the pattern data files because they are the dimensions familiar to the designer, and the transformation for the mask shop is handled automatically. This style is effective for shortening the data conversion time and preventing mishandling of data. We also developed the additional viewer functions of HOTSCOPE® to confirm the pattern layout on the digital display. It is possible to add mask DFM information (design information for mask manufacturability) by the extension to the full SEMI-P10 syntax and by the use of built-in OASIS properties in the future. In this paper, we will discuss the practical application of P10-JOBDECK and the performance results of HOTSCOPE.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masayoshi Mori, Shogo Narukawa, Kiyoshi Yamazaki, Kunihiro Hosono, "Making of P10-JOBDECK with OASIS and GDS-II fit for practical use", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66072O (15 May 2007); doi: 10.1117/12.729007; https://doi.org/10.1117/12.729007
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