15 May 2007 Development of a novel EUV mask protection engineering tool and mask handling techniques
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Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 66073G (2007); doi: 10.1117/12.729035
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan
Abstract
We have developed a mask protection engineering tool (MPE Tool) that simulates various types of tests during the transfer of a mask or blank in air and in vacuum. We performed mask transfer experiments to investigate particle-free mask handling techniques using the MPE and mask inspection tools. We measured the number of particles accumulated during the transfer of the mask blanks. Less than 0.3 particles were added over a path from a load port (in air) to an ESC chamber (in vacuum) and more than half the particles accumulated appeared during the pumping down and purging steps in the load-lock chamber. Consequently, we consider that pumping down and purging are the most important steps for particle-free mask handling.
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Mitsuaki Amemiya, Kazuya Ota, Takashi Kamono, Hiroyoshi Kubo, Youichi Usui, Tadahiko Takikawa, Takao Taguchi, Osamu Suga, "Development of a novel EUV mask protection engineering tool and mask handling techniques", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 66073G (15 May 2007); doi: 10.1117/12.729035; https://doi.org/10.1117/12.729035
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KEYWORDS
Particles

Photomasks

Pellicles

Extreme ultraviolet lithography

Extreme ultraviolet

Atmospheric particles

Inspection

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