RIB waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films
SiO2:TiO2 which were obtained using sol-gel method. Photoresist was applied as a mask in the process. The etching of the films SiO2:TiO2 was carried out in water solutions of ammonia fluoride. The paper presents the determined technological characteristics, power distributions in the obtained strip waveguides and the results of theoretical analysis.
"RIB waveguides fabricated by sol-gel method", Proc. SPIE 6608, Lightguides and Their Applications III, 66080V (9 April 2007); doi: 10.1117/12.739561; https://doi.org/10.1117/12.739561