9 April 2007 RIB waveguides fabricated by sol-gel method
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Proceedings Volume 6608, Lightguides and Their Applications III; 66080V (2007); doi: 10.1117/12.739561
Event: Lightguides and Their Applications III, 2006, Krasnobród, Poland
Abstract
RIB waveguides were fabricated with the use of selective, wet chemical etching of two-component waveguide films SiO2:TiO2 which were obtained using sol-gel method. Photoresist was applied as a mask in the process. The etching of the films SiO2:TiO2 was carried out in water solutions of ammonia fluoride. The paper presents the determined technological characteristics, power distributions in the obtained strip waveguides and the results of theoretical analysis.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paweł Karasiński, Roman Rogoziński, "RIB waveguides fabricated by sol-gel method", Proc. SPIE 6608, Lightguides and Their Applications III, 66080V (9 April 2007); doi: 10.1117/12.739561; https://doi.org/10.1117/12.739561
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KEYWORDS
Waveguides

Etching

Sol-gels

Refractive index

Sensors

Wet etching

Photoresist materials

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