18 June 2007 Experimental validation of 20nm sensitivity of singular beam microscopy
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Abstract
Quickly developing nanotechnology drives the industrial need for fast but sensitive nano-scale feature detection and evaluation. In this work we bypass the diffraction limit for achieving nanoscale sensitivity by introducing optical singularities into the illuminating beam for a modified laser scanning microscopic architecture. A good correspondence was obtained between laboratory experiments and corresponding simulations that indicated a theoretical potential of 1nm sensitivity under a practical signal to noise ratio of 30dB. For analysis of the experimental and simulation results, two simple but effective algorithms were developed. A significant improvement of signal to noise ratio in the optical system with coherent light illumination can be achieved by utilization a highly redundant data collected during experiments. Our experimental results validate achievable sensitivity down to 20nm. The unique combination of nano-scale sensitivity together with implementation simplicity and on-line, real-time analysis capability make Singular Beam Microscopy a valuable industrial analytic method.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Boris Spektor, Alexander Normatov, Joseph Shamir, "Experimental validation of 20nm sensitivity of singular beam microscopy", Proc. SPIE 6616, Optical Measurement Systems for Industrial Inspection V, 661622 (18 June 2007); doi: 10.1117/12.728539; https://doi.org/10.1117/12.728539
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