18 June 2007 Advances in optoelectronic methodology for micro- and nano-scale measurements
Author Affiliations +
Abstract
Advances in emerging technologies of microelectromechanical systems (MEMS) and nanotechnology, especially relating to the applications, constitute one of the most challenging tasks in today's micromechanics and nanomechanics. In addition to design, analysis, and fabrication capabilities, this task also requires advanced test methodologies for determination of functional characteristics of devises produced to enable verification of their operation as well as refinement and optimization of specific designs. In particular, development of miniscule devices requires sophisticated design, analysis, fabrication, testing, and characterization tools. These tools can be categorized as analytical, computational, and experimental. Solutions using the tools from any one category alone do not usually provide necessary information on MEMS and extensive merging, or hybridization, of the tools from different categories is used. One of the approaches employed in this development of structures of contemporary interest, is based on a combined use of the analytical, computational, and experimental solutions (ACES) methodology. Development of this methodology was made possible by recent advances in optoelectronic methodology, which was coupled with the state-of-the-art computational methods, to offer a considerable promise for effective development of various designs. This approach facilitates characterization of dynamic and thermomechanical behavior of the individual components, their packages, and other complex material structures. In this paper, recent advances in optoelectronic methodology for micro-and nanoscale measurements are described and their use is illustrated with representative examples.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ryszard J. Pryputniewicz, Ryszard J. Pryputniewicz, } "Advances in optoelectronic methodology for micro- and nano-scale measurements", Proc. SPIE 6616, Optical Measurement Systems for Industrial Inspection V, 66162V (18 June 2007); doi: 10.1117/12.732042; https://doi.org/10.1117/12.732042
PROCEEDINGS
15 PAGES


SHARE
RELATED CONTENT

Hybrid approach to MEMS reliability assessment
Proceedings of SPIE (January 18 2007)
Dynamic behavior of microstructures
Proceedings of SPIE (August 25 2009)
Study and characterization of a MEMS micromirror device
Proceedings of SPIE (August 01 2004)
Evaluation of microbeam deflection using interferometry
Proceedings of SPIE (June 12 2001)
Precision optical metrology for MEMS
Proceedings of SPIE (October 02 2008)

Back to Top