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18 June 2007 Structure modeling for scatterometric characterization of photoinduced surface-relief gratings
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Surface-relief photo-polymer gratings obtained through the novel technique of photoinduced single step inscription in photopolymers are characterized through various investigations means, with an emphasis on scatterometry. The characterization of the gratings is necessary not only for insight in the creation process of gratings but also for checking the reproducibility and uniformity. The diffraction efficiencies of the various orders diffracted by the grating were measured and they were fitted to theoretical predictions corresponding to various structure models of the gratings. The fitting procedure is used to provide the parameters of the gratings, such as the width, the grating height, the pitch or shape factors, such as the wall angles for a trapezoidal structure. The shape of the gratings was quite complicated and the fitting, for this reason, a challenge. Numerous models were proposed, tried and their advantages and shortcomings discussed.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Petre C. Logofatu, Ileana Apostol, Marie-Claude Castex, Victor Damian, Iuliana Iordache, Mihaela Bojan, and Dan Apostol "Structure modeling for scatterometric characterization of photoinduced surface-relief gratings", Proc. SPIE 6617, Modeling Aspects in Optical Metrology, 661717 (18 June 2007);


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