3 March 2008 Influence of high-temperature vacuum baking on the performance of microchannel plates with an ion barrier film
Author Affiliations +
Proceedings Volume 6621, International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection; 66210B (2008); doi: 10.1117/12.790593
Event: International Symposium on Photoelectronic Detection and Imaging: Technology and Applications 2007, 2007, Beijing, China
Abstract
The fabrication of ion barrier film on microchannel plate (MCP) was introduced. The experimental system for high-temperature vacuum baking on MCP and technological condition were given. The measurement on the electrical properties, the dead-voltage and other parameters of MCP with an ion barrier film were shown. The changes before and after high-temperature vacuum baking were also investigated for the MCP with ion barrier film. By analysis and discussion, it was concluded that high-temperature vacuum baking caused the film's thickness changed, the dead-voltage decreased, and the electron gain decreased with the increase of the film's thickness for the MCP with an ion barrier film.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Delong Jiang, Ye Li, Kui Wu, Guozheng Wang, Shencheng Fu, Xin Wang, Qingduo Duanmu, Jingquan Tian, "Influence of high-temperature vacuum baking on the performance of microchannel plates with an ion barrier film", Proc. SPIE 6621, International Symposium on Photoelectronic Detection and Imaging 2007: Photoelectronic Imaging and Detection, 66210B (3 March 2008); doi: 10.1117/12.790593; https://doi.org/10.1117/12.790593
PROCEEDINGS
7 PAGES


SHARE
KEYWORDS
Ions

Microchannel plates

Aluminum

Image intensifiers

Lead

Chemical species

Oxides

Back to Top