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22 February 2008Diagnosis of electron excited temperature in dielectric barrier discharge by photoelectric method
The electron excited temperature in dielectric barrier discharge under argon at atmospheric pressure is diagnosed by
photoelectric method. The electron excited temperature Texc can be estimated by using spectral lines intensity ratio
method. The spectral lines 763.72nm (2P6→1S5) and 772.63nm (2P2→1S3) in the spectrum range from 690nm to 800nm
are chosen to estimate the electron excite temperature. The power of the discharge gap is calculated by analyzing the
waveform of the apply voltage and the voltage of the test capacitance. The experimental results show that the electron
excited temperature is in the range of 0.19-0.31eV and the discharge power in the gas gap is in the range of 35.7-51.0W
under different discharge gap 0.9-3.0mm. In addition, it is found that the variation tendency of the electron excited
temperature with the discharge gap increasing is similar to that of discharge power, and the electron excited temperature
and discharge power has a minimum value at d=1.1mm. The discharge operates in glow-like mode when the discharge
gap d<1.3mm, and the discharge operates in patterned mode when d>1.3mm. As the discharge gap increase from 1.3mm
to 3.0mm, the streamer channels became brighter, and move faster. The self-organized behavior is also found in the
experiment.
Yanzhao Zhang,Lifang Dong,Yajuan Hao,Weili Fan, andLi Yang
"Diagnosis of electron excited temperature in dielectric barrier discharge by photoelectric method", Proc. SPIE 6622, International Symposium on Photoelectronic Detection and Imaging 2007: Laser, Ultraviolet, and Terahertz Technology, 66220K (22 February 2008); https://doi.org/10.1117/12.790787
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Yanzhao Zhang, Lifang Dong, Yajuan Hao, Weili Fan, Li Yang, "Diagnosis of electron excited temperature in dielectric barrier discharge by photoelectric method," Proc. SPIE 6622, International Symposium on Photoelectronic Detection and Imaging 2007: Laser, Ultraviolet, and Terahertz Technology, 66220K (22 February 2008); https://doi.org/10.1117/12.790787