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5 March 2008 Image pattern recognition application in SEM imaging system
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Proceedings Volume 6623, International Symposium on Photoelectronic Detection and Imaging 2007: Image Processing; 662320 (2008) https://doi.org/10.1117/12.791545
Event: International Symposium on Photoelectronic Detection and Imaging: Technology and Applications 2007, 2007, Beijing, China
Abstract
A pattern search algorithm is proposed to search the region that the users are interested in for SEM inspection system. Effective parameters are needed to classify the image patterns of the wafer. Sometimes there are errors in the ROI recognition because of the strong noise and other reasons. A filter is proposed to remove the wrong selections. Test for multi-patterns SEM images show the algorithm meets the requirement of precision and speed.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hengshu Liu and Xinwei Wang "Image pattern recognition application in SEM imaging system", Proc. SPIE 6623, International Symposium on Photoelectronic Detection and Imaging 2007: Image Processing, 662320 (5 March 2008); https://doi.org/10.1117/12.791545
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