12 March 2008 Preexposure effect on the fabrication of continuous relief microstructure and advanced method
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Proceedings Volume 6624, International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing; 662405 (2008) https://doi.org/10.1117/12.791056
Event: International Symposium on Photoelectronic Detection and Imaging: Technology and Applications 2007, 2007, Beijing, China
Abstract
The principle and application of the preexposure in the fabrication of the continuous relief microstructure of diffractive optical element with polar coordinate Laser Direct Writing method were described in the paper. The paper also studied the rule of preexposure effect during the fabrication of continuous relief microstructure. We gave a substitute method of preexposure used in fabrication process of the microstructure and fabricated one kind of continuous relief microstructure successfully with the new method in the end.
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Duoshu Wang, Duoshu Wang, Chongtai Luo, Chongtai Luo, Hongkai Liu, Hongkai Liu, Ziyu Ye, Ziyu Ye, } "Preexposure effect on the fabrication of continuous relief microstructure and advanced method", Proc. SPIE 6624, International Symposium on Photoelectronic Detection and Imaging 2007: Optoelectronic System Design, Manufacturing, and Testing, 662405 (12 March 2008); doi: 10.1117/12.791056; https://doi.org/10.1117/12.791056
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