Translator Disclaimer
27 April 2007 Electron-beam processing effect on photoemitting-structures parameters and the noise factor of microchannel plates
Author Affiliations +
Proceedings Volume 6636, 19th International Conference on Photoelectronics and Night Vision Devices; 66360K (2007) https://doi.org/10.1117/12.742340
Event: 19th International Conference on Photoelectronics and Night Vision Devices, 2006, Moscow, Russian Federation
Abstract
This paper presents invesigation findings of electron-beam influence on parameters and characteristics of trialcali and bialkali photocathocles of vacuum photoelectric devices and electron-beam amplification channels modification of microchannel plate image intensifier (MCP) of the electrooptical transducer. The electron-beam processing (EBP) increases total sensitivity by 10 - 12% and reduces spoilage in photocathode production to a fourth. The noise factor of MCP subjected EBP before recovery procedure MCP, reduces in 1.5 - 2.0 times, the sensibility of electrooptical transducer increases.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sergey P. Avdeev, Aleksandr A. Kravchenko, Evgeny Yu. Gusev, and Sergey N. Petrov "Electron-beam processing effect on photoemitting-structures parameters and the noise factor of microchannel plates", Proc. SPIE 6636, 19th International Conference on Photoelectronics and Night Vision Devices, 66360K (27 April 2007); https://doi.org/10.1117/12.742340
PROCEEDINGS
7 PAGES


SHARE
Advertisement
Advertisement
Back to Top