Fabrication and optical characterization of Si3N4 2D-photonic crystals for applications in visible range

J. Kouba; S. Kiss; M. Barth; W. Eberhardt; B. Loechel

doi:10.1117/12.734011

11 September 2007 Fabrication and optical characterization of Si₃N₄ 2D-photonic crystals for applications in visible range

J. Kouba, S. Kiss, M. Barth, W. Eberhardt, B. Loechel

Author Affiliations +

Proceedings Volume 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV; 664505 (2007) https://doi.org/10.1117/12.734011
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

The paper presents our experimental results achieved on the field of investigation of LPCVD silicon nitride based two dimensional photonic crystals for visible wavelengths. Our research concentrates on the photonic band gap and defect engineering with respect to the use of silicon nitride based photonic crystals as optical resonators in the visible range of electromagnetic spectra. In order to optically characterize the fabricated photonic crystals, transmission setup utilizing broad band white light source is being used. Using this setup, photonic band gaps in the range between 500 and 900 nm, and thus covering the entire transmission range of LPCVD silicon nitride in the visible range, could be identified for various values of the slab thickness. By incorporating line defects, we fabricated and investigated several photonic crystal filter demonstrators. By optimizing the defect geometry, we achieved transmission values of over 85%.

Citation Download Citation

J. Kouba, S. Kiss, M. Barth, W. Eberhardt, and B. Loechel "Fabrication and optical characterization of Si₃N₄ 2D-photonic crystals for applications in visible range", Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 664505 (11 September 2007); https://doi.org/10.1117/12.734011

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