Fabrication of sub-diffraction-limit molecular structures by scanning near-field photolithography

Robert E. Ducker; Matthew T. Montague; Shuqing Sun; Graham J. Leggett

doi:10.1117/12.735801

11 September 2007 Fabrication of sub-diffraction-limit molecular structures by scanning near-field photolithography

Robert E. Ducker, Matthew T. Montague, Shuqing Sun, Graham J. Leggett

Proceedings Volume 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV; 664513 (2007) https://doi.org/10.1117/12.735801
Event: NanoScience + Engineering, 2007, San Diego, California, United States

Abstract

Using a scanning near-field optical microscope coupled to a UV laser, an approach we term scanning near-field photolithography (SNP), structures as small as 9 nm (ca. λ/30) may be fabricated in self-assembled monolayers of alkanethiols on gold surfaces. Selective exposure of the adsorbate molecules in the near field leads to photoconversion of the alkylthiolate to a weakly bound alkylsulfonate which may be displaced readily be a contrasting thiol, leading to a chemical pattern, or used as a resist for the selective etching of the underlying metal. A novel ultra-mild etch for gold is reported, and used to etch structures as small as 9 nm. Photopatterning of oligo(ethylene glycol) (OEG) terminated selfassembled monolayers facilitates the fabrication of biomolecular nanostructures. Selective removal of the protein-resistant OEG terminated adsorbates created regions that may be functionalized with a second thiol and derivatized with a biomolecule. Finally, the application of SNP to nanopatterning on oxide surfaces is demonstrated. Selective exposure of monolayers of phosphonic acids adsorbed onto aluminum oxide leads to cleavage of the P-C bond and desorption of the adsorbate molecule. Subsequent etching, using aqueous based, yields structures as small as 100 nm.

Citation Download Citation

Robert E. Ducker, Matthew T. Montague, Shuqing Sun, and Graham J. Leggett "Fabrication of sub-diffraction-limit molecular structures by scanning near-field photolithography", Proc. SPIE 6645, Nanoengineering: Fabrication, Properties, Optics, and Devices IV, 664513 (11 September 2007); https://doi.org/10.1117/12.735801

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