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13 September 2007 Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters
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Abstract
The good optical properties of PQ (phenanthrenequinone)-doped PMMA (poly methylmethacrylate) and its flexibility to fabricate different substrate configurations make this material attractive for holographic recording. In previous work, filters in PQ/PMMA for Wavelength Division Multiplexing (WDM) and Optical Code Division Multiple Access (OCDMA) were demonstrated and shown to have a 0.03nm/°C thermal tuning range operating near 1550nm. In this paper we investigate the effect of adding silicon dioxide nanoparticles to PQ/PMMA in order to measure the thermal tuning range and investigate the performance of these filters.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan Manuel Russo, Jose E. Castillo, and Raymond K. Kostuk "Effect of silicon dioxide nanoparticles on the characteristics of PQ/PMMA holographic filters", Proc. SPIE 6653, Linear and Nonlinear Optics of Organic Materials VII, 66530D (13 September 2007); https://doi.org/10.1117/12.732572
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