11 October 2007 Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
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Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. W. Wachulak, P. W. Wachulak, D. Patel, D. Patel, M. G. Capeluto, M. G. Capeluto, C. S. Menoni, C. S. Menoni, J. J. Rocca, J. J. Rocca, M. C. Marconi, M. C. Marconi, } "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser", Proc. SPIE 6702, Soft X-Ray Lasers and Applications VII, 67020I (11 October 2007); doi: 10.1117/12.732900; https://doi.org/10.1117/12.732900


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