11 October 2007 Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser
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Abstract
Combining a compact table top soft X ray laser with an interferometric lithography set up arrays of nanodots and nanoholes were directly patterned on the surface of different photoresists. Multiple exposures with a Lloyd's mirror interferometer printed arrays of holes and dots over an area of 0.5× 0.5 mm2 with typical diameters down to 60 nm full width at half maximum. This laser-based soft X-ray interferometric tool demonstrated the possibility to print different nanoscale patterns using a compact table-top set up.
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P. W. Wachulak, P. W. Wachulak, D. Patel, D. Patel, M. G. Capeluto, M. G. Capeluto, C. S. Menoni, C. S. Menoni, J. J. Rocca, J. J. Rocca, M. C. Marconi, M. C. Marconi, } "Interferometric lithography with sub-100-nm resolution using a tabletop 46.9-nm laser", Proc. SPIE 6702, Soft X-Ray Lasers and Applications VII, 67020I (11 October 2007); doi: 10.1117/12.732900; https://doi.org/10.1117/12.732900
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