Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application

Pinar Demir; Elif Kacar; Erhan Akman; Sinan Kadri Bilikmen; Arif Demir

doi:10.1117/12.733149

17 September 2007 Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application

Pinar Demir, Elif Kacar, Erhan Akman, Sinan Kadri Bilikmen, Arif Demir

Author Affiliations +

Proceedings Volume 6703, Ultrafast X-Ray Sources and Detectors; 67030B (2007) https://doi.org/10.1117/12.733149
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Extreme ultraviolet lithography (EUVL) requires an emission of soft x-rays around a wavelength region of 13.5 nm. EHYBRID simulation was made under the laser operation at 1064 nm with a pulse duration of 6 ns. Intensity was changed between 1 x 10 ¹² W/cm² and 5 x 10 ¹² W/cm². Soft X-rays emitted from Sn XII and Sn XIII ions were simulated by using the EHYBRID code. Ion fractions of the tin ions and the line intensities for different electron temperatures were calculated by using the collisional radiative code NeF.

Citation Download Citation

Pinar Demir, Elif Kacar, Erhan Akman, Sinan Kadri Bilikmen, and Arif Demir "Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application", Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 67030B (17 September 2007); https://doi.org/10.1117/12.733149

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