17 September 2007 Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application
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Abstract
Extreme ultraviolet lithography (EUVL) requires an emission of soft x-rays around a wavelength region of 13.5 nm. EHYBRID simulation was made under the laser operation at 1064 nm with a pulse duration of 6 ns. Intensity was changed between 1 x 10 12 W/cm2 and 5 x 10 12 W/cm2. Soft X-rays emitted from Sn XII and Sn XIII ions were simulated by using the EHYBRID code. Ion fractions of the tin ions and the line intensities for different electron temperatures were calculated by using the collisional radiative code NeF.
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Pinar Demir, Pinar Demir, Elif Kacar, Elif Kacar, Erhan Akman, Erhan Akman, Sinan Kadri Bilikmen, Sinan Kadri Bilikmen, Arif Demir, Arif Demir, "Theoretical and experimental investigation of soft x-rays emitted from TIN plasmas for lithographic application", Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 67030B (17 September 2007); doi: 10.1117/12.733149; https://doi.org/10.1117/12.733149
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