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2 October 2007 New 100-Hz repetition rate soft x-ray laser plasma source for ultrafast XANES applications
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Abstract
We present here a laser based time resolved ultrafast XANES beam line operating with the 100 Hz ALLS facility laser system (100 mJ and 35 fs at 800 nm wavelength). This system is based on a broadband soft x-ray plasma source, produced with a tantalum solid target, and a grazing flat field incidence grating designed to work in the 1-5 nm range. This femtosecond x-ray absorption spectroscopy experimental set up is used to study ultrafast phase transition in vanadium dioxide (VO2). In this model system we are probing the electronic dynamics occurring during semiconductor to metal phase transition following excitation by a femtosecond laser pulse.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
S. Fourmaux, L. Lecherbourg, M. Chagnon, H. C. Bandulet, P. Audebert, and J. C. Kieffer "New 100-Hz repetition rate soft x-ray laser plasma source for ultrafast XANES applications", Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 67030D (2 October 2007); https://doi.org/10.1117/12.735274
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