The new ESRF multilayer deposition facility

Ch. Morawe; Ch. Borel; J.-Ch. Peffen

doi:10.1117/12.734107

20 September 2007 The new ESRF multilayer deposition facility

Ch. Morawe, Ch. Borel, J.-Ch. Peffen

Proceedings Volume 6705, Advances in X-Ray/EUV Optics and Components II; 670504 (2007) https://doi.org/10.1117/12.734107
Event: Optical Engineering + Applications, 2007, San Diego, California, United States

Abstract

Recently, the ESRF Optics Group installed a new multilayer deposition facility. This upgrade was motivated by increasingly demanding requirements for multilayer based x-ray optics on modern 3rd generation synchrotron beamlines. Improved accuracy, stability, and reproducibility are key issues. The deposition process is based on non-reactive magnetron sputtering. The machine is equipped with four cathodes and one ion source for surface treatment. Conducting, insulating, and ferromagnetic materials can be deposited. A linear substrate motion will enable coatings up to 100 cm long and 15 cm wide. The talk will describe the basic concept of the machine and will give an overview of the operating conditions. Initial coating results will complement the presentation.

Citation Download Citation

Ch. Morawe, Ch. Borel, and J.-Ch. Peffen "The new ESRF multilayer deposition facility", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670504 (20 September 2007); https://doi.org/10.1117/12.734107

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