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20 September 2007 Multilayer growth in the APS rotary deposition system
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Abstract
We report our progress in the growth of periodic and depth-graded multilayers in the APS rotary deposition system, a machine designed for fabrication of films tens of microns thick with thousands of layers. A computational method was employed to design depth-graded multilayers for use as wide-angular bandpass reflective optics. We present experimental results for a 154-layer WSi2/Si multilayer system with bilayer thickness ranging from 2.2 nm to 5.5 nm that closely match theoretical flat-top reflectivity predictions of 9.8% from 15.6 mrad to 23.3 mrad at 8 keV.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ray Conley, Chian Liu, Cameron M. Kewish, Albert T. Macrander, and Christian Morawe "Multilayer growth in the APS rotary deposition system", Proc. SPIE 6705, Advances in X-Ray/EUV Optics and Components II, 670505 (20 September 2007); https://doi.org/10.1117/12.736024
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